Chemical Wet Benches.

Chemical Wet Benches.

Robotic Chemical Wet Benches.

Parts Cleaning.

Chemical Wet Benches

Felcon have been manufacturing wet processing stations to the highest industry standard for 20 years. We continue to supply many of the leading companies in the semiconductor, pharmaceutical and electronics industries. We pride ourselves on fully satisfying our clients needs. Our experienced design and construction team have worked together at our production facility in the United Kingdom to perfect our product range. As the needs of the industry changes our flexibility allows us to keep pace with and maintain the standards of satisfaction experienced by our clients.

Wet processing stations feature

• Bath heater systems.
• Filtered recirculation systems.
• Chemical dosing.
• Quick dump rinse systems.
• 1, 2 and 3 stage weir systems.
• Maunfactured to all relevant safety standards.
• Laminar flow to class 1.
• Fully extracted under bench storage or trolleys

Polypropylene, extracted wet bench.
Clear plastic sliding visor.
Trolley storage under bench

One of our units in situ at Sheffield Hallam University

The same unit in action.

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Robotic Chemical Wet Benches

Go to the Robotic Wet Bench page.

Fully automated units capable of handling the most exacting processes on all substrates up to and including 300mm wafers. Benches can be used for a wide variety of purposes, ie cleaning, etching etc. The units maintain all the standard features used in the manual benches.

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Bench with rotary etch attachment, rear panel removed revealing actuator mechanism.

Parts cleaning machines

Designed to wash components in the semiconductor industry using ultrasonics in conjunction with cleaning solutions

Ultrasonic Parts Cleaning Station

2 Bath Ultrasonic Parts Cleaner

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In order to maintain the very highest of standards, we reserve the right to make any variations in the design,

construction and equipment specification of the products described herein without prior notice.